Exposure tool for research and development of photoresists
Photo Process Analysis Exposure Device Series
<Main lineup of resist analysis exposure equipment> ■UVES-2000 (Supports g-line/h-line/i-line/248nm and broad light analysis exposure equipment) ■VUVES-4700i (Supports 248nm, 193nm exposure, and 193nm immersion exposure) ■EUVES-7000 (Equipped with an EUV light source, capable of 13.5nm open frame exposure)
- Company：リソテックジャパン
- Price：Other
